Electro-optic modulation in single-crystal LiNbO/sub 3/ thin films

Summary form only given.Recently, an ion-implantation based technique, known as crystal ion slicing has been shown to yield single-crystal LiNbO/sub 3/ films on semiconductors and other platforms. In this technique, ion implantation is used to define a sacrificial layer which is then etched away in a dilute hydrofluoric acid solution. The thickness of the film is defined by the implantation energy. We report measurements of the electro-optical response of film and report on the techniques used to prepare the films and to emphasize their performance. We show that the electro-optic response of these films is comparable to that of single-crystal bulk, and is superior to values previously reported in the literature for polycrystalline films. Further the thin film geometry used has been shown to yield lower half-wave voltage for device operation.