DocumentCode :
2931866
Title :
High-Q sificon-based microring resonators fabricated using 248 nm optical lithography
Author :
Maki, P.A. ; Fritze, M. ; Lim, D.R. ; Little, B.E. ; Palmateer, S.C. ; Kimerling, L.C. ; Haus, H.A.
Author_Institution :
Lincoln Laboratory
fYear :
2000
fDate :
7-12 May 2000
Firstpage :
686
Lastpage :
687
Keywords :
Electron optics; Etching; Lithography; Optical buffering; Optical films; Optical losses; Optical resonators; Optical scattering; Silicon; Wavelength division multiplexing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-634-6
Type :
conf
DOI :
10.1109/CLEO.2000.907505
Filename :
907505
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2931866
