DocumentCode
2932317
Title
Performance and reliability of a 4Mb Si nanocrystal NOR Flash memory with optimized 1T memory cells
Author
Gerardi, C. ; Molas, G. ; Albini, G. ; Tripiciano, E. ; Gely, M. ; Emmi, A. ; Fiore, O. ; Nowak, E. ; Mello, D. ; Vecchio, M. ; Masarotto, L. ; Portoghese, R. ; De Salvo, B. ; Deleonibus, S. ; Maurelli, A.
Author_Institution
Numonyx, Agrate Brianza
fYear
2008
fDate
15-17 Dec. 2008
Firstpage
1
Lastpage
4
Abstract
We present excellent performance and reliability characteristics of a Silicon nanocrystal (Si-nc) 4 Mb NOR Flash array (90 nm technology node). Main original technological improvements are a cylindrical symmetry of the 1-Transistor bitcell, which significantly increases the coupling ratio (particularly critical in Si-nc memories), and the use of an optimized ONO control dielectric, which prevents from parasitic charge trapping during cycling. Results shown here in terms of memory performance, high temperature reliability, endurance and disturbs are, at our knowledge, outstanding compared to literature state-of-the-art and demonstrate the high potential of this technology for embedded memory applications.
Keywords
NOR circuits; elemental semiconductors; flash memories; integrated circuit reliability; integrated memory circuits; nanostructured materials; silicon; 1-transistor bitcell; high temperature reliability; memory cells; nanocrystal NOR flash memory; parasitic charge trapping; silicon nanocrystal; storage capacity 4 Mbit; Annealing; CMOS technology; Character generation; Dielectrics; Flash memory; Nanocrystals; Nonvolatile memory; Passivation; Shape; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2008. IEDM 2008. IEEE International
Conference_Location
San Francisco, CA
ISSN
8164-2284
Print_ISBN
978-1-4244-2377-4
Electronic_ISBN
8164-2284
Type
conf
DOI
10.1109/IEDM.2008.4796823
Filename
4796823
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