Effect of Magnetic Recording Layer Thickness on Media Performance in CoCrPtO Perpendicular Media

Author

Kwon, U. ; Jung, H. ; Kuo, M. ; Velu, E. ; Malhotra, S.S. ; Bertero, G. ; Sinclair, R.

Author_Institution

Stanford Univ., Stanford

fYear

2006

fDate

8-12 May 2006

Firstpage

10

Lastpage

10

Abstract

In this study, the effect of magnetic recording layer thickness on media performance in CoCrPtO perpendicular media was investigated. The thin films were reactively sputter-deposited on NiP-coated Al substrates. Ru/Ta was used as an interlayer and the total thickness of the synthetic antiferromagnetically-coupled SUL was 140 nm. The CoCrPtO layer thickness was varied from 2 to 27 nm. Saturation magnetization (Ms) of the CoCrPtO layer, obtained from a slope of saturation magnetization per unit area versus media thickness (tMAG), was 450 emu/cm3. The film orientation and microstructure were investigated by X-ray diffraction (XRD) and transmission electron microscopy (TEM). Polar magneto-optic Kerr effect (MOKE) magnetometer and vibrating sample magnetometer (VSM) were used to measure the magnetic properties. Recording performance was evaluated by using a spin-stand tester with a single-pole-type writer and a GMR reader.

Keywords

Kerr magneto-optical effect; X-ray diffraction; antiferromagnetic materials; chromium compounds; cobalt compounds; crystal microstructure; magnetic thin films; magnetisation; perpendicular magnetic recording; ruthenium; soft magnetic materials; sputter deposition; tantalum; transmission electron microscopy; CoCrPtO; GMR reader; Ru-Ta; X-ray diffraction; film microstructure; film orientation; layer thickness; magnetic recording layer thickness; magnetic thin films; polar magneto-optic Kerr effect magnetometer; saturation magnetization; single-pole-type writer; size 2 nm to 27 nm; spin-stand tester; sputter deposition; transmission electron microscopy; vibrating sample magnetometer; Antiferromagnetic materials; Magnetic films; Magnetic recording; Magnetometers; Magnetooptic recording; Microstructure; Saturation magnetization; Sputtering; Substrates; X-ray diffraction;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2006. INTERMAG 2006. IEEE International

Conference_Location

San Diego, CA

Print_ISBN

1-4244-1479-2

Type

conf

DOI

10.1109/INTMAG.2006.375419

Filename

4261444