Title :
Photosensitivity in phosphorus fibers
Author_Institution :
AT&T Bell Labs., Murray Hill, NJ, USA
fDate :
25 Feb.-1 March 1996
Abstract :
Summary form only given. The emergence of ultraviolet (UV)-induced fiber phase gratings in germanium-doped silica fibers has generated significant interest for many wavelength-routing applications in optical amplifiers and wavelength-division multiplexing (WDM) transmission systems. The photosensitive index changes in germanosilicate fibers resulting from exposure to UV light has been long established, however only in the past two years have changes been reported for phosphosilicate materials. This was first reported in hydrogen-sensitized phosphorus fiber exposed at 248 nm.
Keywords :
diffraction gratings; hydrogen; optical fibres; phosphorus; refractive index; sensitivity; 248 nm; P:H; UV light; UV-induced fiber phase gratings; WDM transmission systems; germanosilicate fibers; hydrogen-sensitized phosphorus fiber; optical amplifiers; phosphorus fibers; phosphosilicate materials; photosensitive index changes; photosensitivity; wavelength-division multiplexing; wavelength-routing applications; Fiber gratings; Germanium; Optical fiber devices; Optical modulation; Optical waveguides; Pulse modulation; Refractive index; Silicon compounds; Wavelength division multiplexing; Writing;
Conference_Titel :
Optical Fiber Communications, 1996. OFC '96
Print_ISBN :
1-55752-422-X
DOI :
10.1109/OFC.1996.907660
