DocumentCode :
2933555
Title :
Consideration of conductive filament for realization of low-current and highly-reliable TaOx ReRAM
Author :
Yasuhara, R. ; Ninomiya, Tamotsu ; Muraoka, S. ; Wei, Zhihui ; Katayama, Kengo ; Takagi, Toshiyuki
Author_Institution :
Device Solutions Center, Panasonic Corp., Kyoto, Japan
fYear :
2013
fDate :
26-29 May 2013
Firstpage :
34
Lastpage :
37
Abstract :
Characteristics and their origin of a conductive filament in TaOx ReRAM are investigated. The results of systematic experimentation demonstrate that the formation of a small conductive filament with high density of oxygen vacancies, achieved by controlling the oxygen content of the resistance-switching material and forming/set current, is the key to achieving low-current switching combined with long retention.
Keywords :
electric resistance; oxygen; random-access storage; tantalum compounds; vacancies (crystal); TaOx; conductive filament; highly-reliable ReRAM; low-current ReRAM; low-current switching; oxygen content; oxygen vacancies; resistance-switching material; Oxygen; Reliability; Resistance; Switches; Systematics; Filament; Oxygen vacancy; ReRAM; Retention;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Memory Workshop (IMW), 2013 5th IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4673-6168-2
Type :
conf
DOI :
10.1109/IMW.2013.6582091
Filename :
6582091
Link To Document :
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