Title :
Permalloy Patterning Effects on RF Inductors
Author :
Ni, W. ; Kim, J. ; Kan, E.
Author_Institution :
Cornell Univ., Ithaca
Abstract :
Permalloy incorporated RF spiral inductors are fabricated on standard Si-substrates with a CMOS compatible process. Various patterns of permalloy thin-film stripe are designed to investigate their influences on the inductor performance with respect to different magnetization orientations, ferromagnetic resonance (FMR), induced eddy current, parasitic capacitance and substrate loss. The BH loop for the array of rectangular permalloy stripes with an aspect ratio of 30 shows good soft magnetic properties, such as a magnetic saturation 4piMs of 25 kG, a dc coercivity of 5 Oe, and an anisotropy field of 8 Oe. Permalloy thin films is proved to have effect on reducing the substrate loss, and the magnetic shielding efficiency depends on the total volume of the permalloy in the patterns.
Keywords :
Permalloy; capacitance; coercive force; eddy current losses; eddy currents; ferromagnetic materials; ferromagnetic resonance; inductors; magnetic anisotropy; magnetic hysteresis; magnetic leakage; magnetic shielding; magnetic thin films; metallic thin films; soft magnetic materials; BH loop; CMOS process; FMR; NiFe; RF spiral inductors; Si substrate; anisotropy field; dc coercivity; ferromagnetic resonance; induced eddy current; magnetic saturation; magnetic shielding efficiency; magnetization orientation; parasitic capacitance; permalloy patterning; permalloy thin-film stripe patterns; soft magnetic properties; substrate loss; CMOS process; Eddy currents; Magnetic resonance; Magnetic shielding; Magnetization; Performance loss; Radio frequency; Spirals; Substrates; Thin film inductors;
Conference_Titel :
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-1479-2
DOI :
10.1109/INTMAG.2006.375630