A New Siloxane Functional Polymer for Chemical Vapor Sensor

Author

Huang, Jia ; Jiang, Yadong ; Du, Xiaosong ; Bi, Juan

Author_Institution

State Key Lab. of Electron. Thin Film & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China

fYear

2010

fDate

19-21 June 2010

Firstpage

1

Lastpage

5

Abstract

A new hydrogen-bond acidic groups functionalized siloxane polymer for quartz crystal microbalance sensors (QCMs) application was synthesized via O-alkylation, claisen rearrange, hydrosilylation and hexafluoroacetone groups (HFA) electrophilic addition reaction. This hexafluoroisopropanol functionalized polysiloxane was confirmed by FT-IR and ¹HNMR, and coated onto a AT-cut 8 MHz QCM sensors to investigate its gas sensitive responses to the organophosphorus nerve agent stimulant dimethyl methylphosphonate (DMMP) vapor as well as other organic chemical vapors. The results indicated that frequency change of this functionalized polysiloxane based QCM sensors to the DMMP vapor were completely linear, and with a regression coefficient of 0.9993 in the concentration range of 10-60 ppm. In addition, the sensitivity of the fabricated QCM sensors to DMMP was up to 23.07 Hz/ppm, and much higher than the other chemical vapors, the detection limits of this fabricated QCM sensors was as low as 0.13 ppm.

Keywords

Fourier transform spectra; chemical sensors; infrared spectra; polymers; proton magnetic resonance; ¹HNMR; O-alkylation; QCM sensor; chemical vapor sensor; dimethyl methylphosphonate vapor; hydrogen-bond acidic group; hydrosilylation and hexafluoroacetone group; organic chemical vapor; quartz crystal microbalance sensor; regression coefficient; siloxane functional polymer; Chemical sensors; Chemical technology; Coatings; Frequency; Gas detectors; Materials science and technology; Optoelectronic and photonic sensors; Organic chemicals; Polymer films; Thin film sensors;

fLanguage

English

Publisher

ieee

Conference_Titel

Photonics and Optoelectronic (SOPO), 2010 Symposium on

Conference_Location

Chengdu

Print_ISBN

978-1-4244-4963-7

Electronic_ISBN

978-1-4244-4964-4

Type

conf

DOI

10.1109/SOPO.2010.5504075

Filename

5504075