DocumentCode :
2937695
Title :
Fabrication of wafer level chip scale packaging for optoelectronic devices
Author :
Jim, K.L. ; Faulkner, G.E. ; O´Brien, D.C. ; Edwards, D.J. ; Lau, J.H.
Author_Institution :
Dept. of Eng. Sci., Oxford Univ., UK
fYear :
1999
fDate :
1999
Firstpage :
1145
Lastpage :
1147
Abstract :
A novel, simple processing and wafer level packaging method for a 4×4 Resonant Cavity LEDs chip with individual array is under development. Palladium/Gold (Pd/Au) alloys are used as p-type contacts and as rewiring metallization for optoelectronic devices to improve the fabrication process. By use of these alloys we have found a reduction of a factor of 10 in the resistance compared to Titanium/Gold (Ti/Au), due to the formation of a conducting oxide at the interface between the metal and semiconductor. On the packaging side, electroplated solder deposition was used to fabricate eutectic solderbump arrays on the chip. For the Under Bump Metallurgies (UBM), a thin layer (100 nm) of Ti and a layer (200 nm) of Cu was sputtered on the wafer. A 10 μm thick copper stud is platted on top of the UBM to be used as a stem for the solder
Keywords :
chip scale packaging; light emitting diodes; Cu; Pd-Au; Ti; conducting oxide; contact resistance; copper stud; electroplating deposition; eutectic solder bump array; fabrication; metal-semiconductor interface; optoelectronic device; p-type contact; palladium/gold alloy; resonant cavity LED; rewiring metallization; sputtered layer; under bump metallurgy; wafer level chip scale packaging; Chip scale packaging; Copper; Gold alloys; Light emitting diodes; Metallization; Optical device fabrication; Optoelectronic devices; Palladium; Resonance; Wafer scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference, 1999. 1999 Proceedings. 49th
Conference_Location :
San Diego, CA
ISSN :
0569-5503
Print_ISBN :
0-7803-5231-9
Type :
conf
DOI :
10.1109/ECTC.1999.776335
Filename :
776335
Link To Document :
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