DocumentCode
2937695
Title
Fabrication of wafer level chip scale packaging for optoelectronic devices
Author
Jim, K.L. ; Faulkner, G.E. ; O´Brien, D.C. ; Edwards, D.J. ; Lau, J.H.
Author_Institution
Dept. of Eng. Sci., Oxford Univ., UK
fYear
1999
fDate
1999
Firstpage
1145
Lastpage
1147
Abstract
A novel, simple processing and wafer level packaging method for a 4×4 Resonant Cavity LEDs chip with individual array is under development. Palladium/Gold (Pd/Au) alloys are used as p-type contacts and as rewiring metallization for optoelectronic devices to improve the fabrication process. By use of these alloys we have found a reduction of a factor of 10 in the resistance compared to Titanium/Gold (Ti/Au), due to the formation of a conducting oxide at the interface between the metal and semiconductor. On the packaging side, electroplated solder deposition was used to fabricate eutectic solderbump arrays on the chip. For the Under Bump Metallurgies (UBM), a thin layer (100 nm) of Ti and a layer (200 nm) of Cu was sputtered on the wafer. A 10 μm thick copper stud is platted on top of the UBM to be used as a stem for the solder
Keywords
chip scale packaging; light emitting diodes; Cu; Pd-Au; Ti; conducting oxide; contact resistance; copper stud; electroplating deposition; eutectic solder bump array; fabrication; metal-semiconductor interface; optoelectronic device; p-type contact; palladium/gold alloy; resonant cavity LED; rewiring metallization; sputtered layer; under bump metallurgy; wafer level chip scale packaging; Chip scale packaging; Copper; Gold alloys; Light emitting diodes; Metallization; Optical device fabrication; Optoelectronic devices; Palladium; Resonance; Wafer scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 1999. 1999 Proceedings. 49th
Conference_Location
San Diego, CA
ISSN
0569-5503
Print_ISBN
0-7803-5231-9
Type
conf
DOI
10.1109/ECTC.1999.776335
Filename
776335
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