• DocumentCode
    2937842
  • Title

    Area-Dependence of High Frequency Spin-Transfer Resonance in GMR Contacts up to 300 nm Diameter

  • Author

    Mancoff, F. ; Rizzo, N. ; Engel, B. ; Tehrani, S.

  • Author_Institution
    Freescale Semicond. Inc., Chandler
  • fYear
    2006
  • fDate
    8-12 May 2006
  • Firstpage
    265
  • Lastpage
    265
  • Abstract
    The area-dependence of spin-transfer resonance in giant magnetoresistance (GMR) contacts from 50-300 nm diameter d is measured in this paper. With increasing d , a decreasing slope df/dl of precession frequency vs. current and an increasing critical current Ic is found. The data is well fit by a model where the precessing region extends outside the contact by a ring of width delta~ 50 nm. A GMR film with a base electrode, a 20 nm Co81Fe19 fixed layer, a 6 nm Cu spacer layer, a 4.5 nm Ni80Fe20 free layer, and a cap. The point contacts were written by optical or e-beam lithography and formed through SiO2 or hardened PMMA. The inset shows an SEM image of a nominally 60 nm diameter contact. A dc current I is applied to the contact using a high-frequency bias tee and microwave probe and measured the GMR frequency spectrum. A magnetic field ~1 T normal to the film saturated the free moment out-of-plane at I=0 and tilted the fixed moment ~30deg out-of-plane.
  • Keywords
    cobalt alloys; copper; electrodes; electron beam lithography; giant magnetoresistance; iron alloys; magnetic moments; magnetic thin films; metallic thin films; nickel alloys; photolithography; point contacts; scanning electron microscopy; spin systems; Co81Fe19-Cu-Ni80Fe20 - Interface; GMR film; SEM; area-dependence; base electrode; dc current; e-beam lithography; giant magnetoresistance contacts; hardened PMMA; high frequency spin-transfer resonance; magnetic field; magnetic moment; microwave probe; optical lithography; point contacts; precession frequency; size 20 nm; size 4.5 nm; size 6 nm; Area measurement; Critical current; Electrodes; Giant magnetoresistance; Iron; Magnetic field measurement; Optical films; Optical saturation; Resonance; Resonant frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2006. INTERMAG 2006. IEEE International
  • Conference_Location
    San Diego, CA
  • Print_ISBN
    1-4244-1479-2
  • Type

    conf

  • DOI
    10.1109/INTMAG.2006.375847
  • Filename
    4261698