• DocumentCode
    2939231
  • Title

    Scratch Types and Damage Thresholds of Fused Silica

  • Author

    Jiang, Yong ; Yuan, Xiaodong ; Xiang, Xia ; Wang, Haijun ; Xu, Shizhen ; Chen, Meng ; Li, Xibin ; Zheng, Wanguo ; Zu, Xiaotao

  • Author_Institution
    Sch. of Phys. Electron., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
  • fYear
    2010
  • fDate
    19-21 June 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Atom force microscopy (AFM) is used to investigate micro-morphology of various types of scratches in the fused silica surface and sub-surface. Based on the shape, scratches can be classified as lateral scratch, radial scratch, Hertizan cone scratch, and trailing indent scratch. From forming mechanism, scratches can be classified as plastic scratch, brittle scratch and mixed scratch. The statistical damage thresholds of three kinds of common scratches are obtained through raster scanning at different laser fluences. The results show that the damage threshold of radial scratches is the highest and that of the trailing indent scratches is the lowest. In addition, for the samples etched in different concentration buffered hydrofluoric acid solutions for different etching time, the damage thresholds are also obtained. The high concentration and long-time etching can effectively enhance the damage threshold of scratches. Brittle scratches are easier to damage than plastic scratches. Two kinds of mechanisms are responsible for the laser damage: local electrical intensification and mechanical weakness induced by scratches. This work is a reference for further investigation on damage threshold enhancement and damage mechanism of scratches in fused silica.
  • Keywords
    atomic force microscopy; etching; silicon compounds; surface structure; Hertizan cone scratch; SiO2; atom force microscopy; brittle scratch; damage threshold enhancement; etching; fused silica damage threshold; fused silica surface; hydrofluoric acid solutions; laser damage; laser fluences; local electrical intensification; mechanical weakness; micromorphology; plastic scratches; radial scratch; radial scratch damage threshold; scratch types; Atomic force microscopy; Etching; Hafnium; Laser modes; Optical buffering; Optical microscopy; Shape; Silicon compounds; Surface morphology; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics and Optoelectronic (SOPO), 2010 Symposium on
  • Conference_Location
    Chengdu
  • Print_ISBN
    978-1-4244-4963-7
  • Electronic_ISBN
    978-1-4244-4964-4
  • Type

    conf

  • DOI
    10.1109/SOPO.2010.5504301
  • Filename
    5504301