DocumentCode :
2941273
Title :
Low power cross-point memory architecture
Author :
Bateman, Bruce ; Siau, Chang ; Chevallier, Christophe
Author_Institution :
Unity Semicond. Corp., Sunnyvale, CA, USA
fYear :
2011
fDate :
14-16 Nov. 2011
Firstpage :
173
Lastpage :
176
Abstract :
Design techniques are described for building cross-point resistive memory arrays without the use of a selection device for each resistive memory element. A memory cell selection technique is shown to allow the use of low voltage transistors and to solve IR drop, electro-migration and disturb issues on the selected array lines. Physical implementation is also presented.
Keywords :
CMOS memory circuits; electromigration; integrated circuit design; low-power electronics; transistors; CMOS memory cell; IR drop; cross-point resistive memory array line; electromigration; low power cross-point memory architecture; low voltage transistor; memory cell selection technique; resistive memory element; Logic gates; Low voltage; Memory management; Metals; Microprocessors; Programming;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Circuits Conference (A-SSCC), 2011 IEEE Asian
Conference_Location :
Jeju
Print_ISBN :
978-1-4577-1784-0
Type :
conf
DOI :
10.1109/ASSCC.2011.6123630
Filename :
6123630
Link To Document :
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