Title :
Characterization and thermal analysis of a 48 V GaN HFET device technology for wireless infrastructure applications
Author :
Green, B.M. ; Henry, H. ; Selbee, J. ; Clayton, F. ; Moore, K. ; CdeBaca, M. ; Abdou, J. ; Liu, C-L. ; Hartin, O. ; Hill, D. ; Miller, M. ; Weitzel, C.E.
Author_Institution :
Freescale Semiconductor, Inc., 2100 E. Elliot Rd. MD EL720, Tempe, Arizona 85284, USA
Abstract :
This report presents the DC, pulsed I-V, small signal, and large signal characteristics of Freescalepsilas 48 V GaN HFET technology. Characterization of large signal performance for a 12.6 mm at 48 V drain bias shows 89 W output power with an associated power density of 7.1 W/mm, linear gain of 17.5 dB, and a power-added efficiency (PAE) of 62%. Analysis of channel temperature over drain bias shows that the maximum channel temperatures at 28 V and 48 V are 107 degC and 245 degC, respectively during saturated RF operation. Data for RF drift over time on a 16.2 mm device show less than 0.2 dB of RF drift for >1000 hrs. of testing. This level of RF performance represents a significant >4 dB gain and >2 W/mm power density improvement over Freescalepsilas previously reported GaN HFET technology.
Keywords :
III-V semiconductors; gallium compounds; high electron mobility transistors; wide band gap semiconductors; GaN; HFET device technology; RF performance; power 89 W; power density; power-added efficiency; size 12.6 mm; size 16.2 nm; temperature 107 degC; temperature 245 degC; thermal analysis; voltage 28 V; voltage 48 V; wireless infrastructure applications; Gallium nitride; HEMTs; MODFETs; Performance gain; Power generation; Pulse amplifiers; Radio frequency; Silicon carbide; Substrates; Temperature;
Conference_Titel :
Microwave Symposium Digest, 2008 IEEE MTT-S International
Conference_Location :
Atlanta, GA
Print_ISBN :
978-1-4244-1780-3
Electronic_ISBN :
0149-645X
DOI :
10.1109/MWSYM.2008.4632916