DocumentCode
2941829
Title
Micromagnetics of magnetization reversal in pattern magnetic recording medium
Author
Smith, C.E.D. ; Khizroev, S. ; Wolfe, J.C. ; Weller, Dieter ; Litvinov, Dmtri
Author_Institution
Univ. of Houston, Houston
fYear
2006
fDate
8-12 May 2006
Firstpage
483
Lastpage
483
Abstract
Micromagnetic modeling based on LLG formalism was used to study the magnetization reversal processes in patterned recording layer. The write fields generated by an idealized single pole write head with a uniformly magnetized air-bearing surface (ABS) were used. The applied write field is highly nonuniform within a bit, making consistent comparison based on its values difficult. The effects of the bit geometry, medium thickness, head/medium magnetic spacing (flying height), ABS geometry, the effects of neighboring bits on magnetization reversal, and the sensitivity of the write process to non-zero write misregistration (WMR) were investigated. It was shown that the larger ABS cross-section heads generate stronger write fields resulting in a capability of using higher anisotropy/better thermal stability media materials. Also, the sensitivity on WMR is weaker for larger ABS cross-section heads simplifying the optimization of a recording system design.
Keywords
magnetic anisotropy; magnetic heads; magnetic recording; magnetisation reversal; micromagnetics; optimisation; thermal stability; LLG formalism; bit geometry; flying height; head/medium magnetic spacing; magnetic anisotropy; magnetization reversal processes; magnetized air-bearing surface; medium thickness; micromagnetic modeling; patterned magnetic recording medium; recording system design optimization; single pole write head; thermal stability media materials; write process sensitivity; Anisotropic magnetoresistance; Geometry; Magnetic anisotropy; Magnetic heads; Magnetic materials; Magnetic recording; Magnetization reversal; Micromagnetics; Perpendicular magnetic anisotropy; Thermal stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location
San Diego, CA
Print_ISBN
1-4244-1479-2
Type
conf
DOI
10.1109/INTMAG.2006.376207
Filename
4261916
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