DocumentCode :
2942448
Title :
Magnetic and Thermal Properties of MoN Underlayer for Spin Valves Depending on Nitrogen Concentration
Author :
Kim, J. ; Choi, Y. ; Jo, S. ; Kim, S. ; Lee, C.
Author_Institution :
Soongsil Univ., Seoul
fYear :
2006
fDate :
8-12 May 2006
Firstpage :
518
Lastpage :
518
Abstract :
This article presents an investigation on the change of magnetic and thermal properties of spin valve devices for various nitrogen concentrations in MoN underlayer. Also, the properties of Mo and MoNX thin film with those of Ta and TaNX underlayers were compared.
Keywords :
annealing; cobalt alloys; copper; iridium alloys; iron alloys; magnetic multilayers; manganese alloys; molybdenum compounds; nickel alloys; silicon; silicon compounds; spin valves; sputtered coatings; tantalum compounds; CoFe-IrMn-Ta; MoN; MoN underlayer; MoNX thin film; Si-SiO2-MoN-NiFe-CoFe-Cu; TaN; TaNX underlayer; molybdenum thin film; nitrogen concentration; size 0.5 inch; size 18 A; size 21 A; size 22 A; size 25 A; size 28 A; size 35 A; size 65 A; spin valve devices; tantalum underlayer; temperature 300 degC; time 60 min; underlayer magnetic properties; underlayer thermal properties; wavelength 200 mum; wavelength 500 mum; Annealing; Fluid flow; Magnetic anisotropy; Magnetic properties; Nitrogen; Perpendicular magnetic anisotropy; Spin valves; Sputtering; Substrates; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-1479-2
Type :
conf
DOI :
10.1109/INTMAG.2006.376242
Filename :
4261951
Link To Document :
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