DocumentCode
2942491
Title
Temperature Dependence of Magnetotransport in EMR Devices
Author
Boone, T.D. ; Folks, L. ; Katine, J. ; Marinero, E. ; Nicoletti, S. ; Gurney, B.A. ; Field, M. ; Sullivan, G.J. ; Ikhlassi, A. ; Brar, B.
Author_Institution
Hitachi Global Storage Technol., San Jose
fYear
2006
fDate
8-12 May 2006
Firstpage
520
Lastpage
520
Abstract
Extraordinary magneto-resistance (EMR) devices have been fabricated and characterized at various magnetic fields, operating temperatures and current excitations. These devices are comprised of non-magnetic high mobility semiconductors and low resistance metallic contacts and shunts. The EMR devices were fabricated using two e-beam lithography processing. The completed EMR devices were tested between 300K and 5K in magnetic fields up to 5 T perpendicular to the 2DEG plane and excitation currents up to 100 A. EMR sensors for high density recording will have device structures smaller than the electron mean free path (mfp) in the full film semiconductor 2DEG. In this regime the electron transport is transitioning from diffusive to ballistic, and it is of scientific and practical interest to determine how the magnetic sensitivity evolves.
Keywords
ballistic transport; electron beam lithography; enhanced magnetoresistance; galvanomagnetic effects; magnetic sensors; magnetoresistive devices; semiconductor-metal boundaries; two-dimensional electron gas; 2DEG; EMR devices; EMR sensors; e-beam lithography; electron transport; extraordinary magnetoresistance devices; high mobility semiconductors; magnetotransport; metallic contacts; Contact resistance; Electrons; Lithography; Magnetic devices; Magnetic fields; Magnetic semiconductors; Magnetic sensors; Perpendicular magnetic recording; Semiconductor device testing; Temperature dependence;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location
San Diego, CA
Print_ISBN
1-4244-1479-2
Type
conf
DOI
10.1109/INTMAG.2006.376244
Filename
4261953
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