• DocumentCode
    2942491
  • Title

    Temperature Dependence of Magnetotransport in EMR Devices

  • Author

    Boone, T.D. ; Folks, L. ; Katine, J. ; Marinero, E. ; Nicoletti, S. ; Gurney, B.A. ; Field, M. ; Sullivan, G.J. ; Ikhlassi, A. ; Brar, B.

  • Author_Institution
    Hitachi Global Storage Technol., San Jose
  • fYear
    2006
  • fDate
    8-12 May 2006
  • Firstpage
    520
  • Lastpage
    520
  • Abstract
    Extraordinary magneto-resistance (EMR) devices have been fabricated and characterized at various magnetic fields, operating temperatures and current excitations. These devices are comprised of non-magnetic high mobility semiconductors and low resistance metallic contacts and shunts. The EMR devices were fabricated using two e-beam lithography processing. The completed EMR devices were tested between 300K and 5K in magnetic fields up to 5 T perpendicular to the 2DEG plane and excitation currents up to 100 A. EMR sensors for high density recording will have device structures smaller than the electron mean free path (mfp) in the full film semiconductor 2DEG. In this regime the electron transport is transitioning from diffusive to ballistic, and it is of scientific and practical interest to determine how the magnetic sensitivity evolves.
  • Keywords
    ballistic transport; electron beam lithography; enhanced magnetoresistance; galvanomagnetic effects; magnetic sensors; magnetoresistive devices; semiconductor-metal boundaries; two-dimensional electron gas; 2DEG; EMR devices; EMR sensors; e-beam lithography; electron transport; extraordinary magnetoresistance devices; high mobility semiconductors; magnetotransport; metallic contacts; Contact resistance; Electrons; Lithography; Magnetic devices; Magnetic fields; Magnetic semiconductors; Magnetic sensors; Perpendicular magnetic recording; Semiconductor device testing; Temperature dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2006. INTERMAG 2006. IEEE International
  • Conference_Location
    San Diego, CA
  • Print_ISBN
    1-4244-1479-2
  • Type

    conf

  • DOI
    10.1109/INTMAG.2006.376244
  • Filename
    4261953