DocumentCode
2942541
Title
Aluminum gallium nitride/silicon carbide separate absorption and multiplication avalanche photodiodes
Author
Rodak, L.E. ; Sampath, A.V. ; Gallinat, C.S. ; Enck, R.W. ; Smith, Johan ; Shen, Haiying ; Wraback, M. ; Chen, Yuanfeng ; Zhou, Qu ; Campbell, Joe C.
Author_Institution
U.S. Army Res. Lab., Adelphi, MD, USA
fYear
2012
fDate
7-9 Aug. 2012
Firstpage
1
Lastpage
4
Abstract
AlGaN/SiC separate absorption and multiplication avalanche photodiodes (SAM-APD) offer a unique approach for fabricating high gain photodetectors with tunable absorption in the deep ultraviolet regime. However, unlike conventional heterojunction SAM APDs, the formation of charge at the hetero-interface arising from spontaneous and piezoelectric polarization can dramatically affect device performance. This paper discusses the role of interface charge on device operation and the use of nitride interface control layers as a means to optimize it. A thin AlN layer inserted at the AlGaN/SiC hetero-interface is shown to be effective in reducing the net interface charge.
Keywords
III-V semiconductors; aluminium compounds; avalanche photodiodes; gallium compounds; optical fabrication; photodetectors; piezoelectricity; semiconductor heterojunctions; silicon compounds; ultraviolet detectors; ultraviolet spectra; wide band gap semiconductors; AlGaN-SiC-AlN; aluminum gallium nitride-silicon carbide SAM-APD; deep ultraviolet regime; device operation; device performance; heterointerface; high gain photodetectors; net interface charge; nitride interface control layers; optimization; piezoelectric polarization; separate absorption-and-multiplication avalanche photodiodes; spontaneous polarization; thin layer; tunable absorption; Absorption; Aluminum gallium nitride; Electric fields; HEMTs; MODFETs; Photonic band gap; Silicon carbide; aluminum gallium nitride; avalanche photodiode; silicon carbide; ultra-violet;
fLanguage
English
Publisher
ieee
Conference_Titel
Lester Eastman Conference on High Performance Devices (LEC), 2012
Conference_Location
Singapore
Print_ISBN
978-1-4673-2298-0
Electronic_ISBN
978-1-4673-2300-0
Type
conf
DOI
10.1109/lec.2012.6410993
Filename
6410993
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