Author_Institution :
Dept. of Phys. & Astron, Appalachian State Univ., Boone, NC, USA
fDate :
Feb. 28 2011-March 2 2011
Abstract :
Electron and ion beams are widely utilized in both fabrication and analysis of semiconductor devices. This talk will highlight examples of device edit and repair using Focused Ion Beams (FIB) for high resolution sputtering for cross sectional imaging, ion beam induced deposition and etch for device modification and repair, and the use of electron beams for fabrication, inspection and analysis. Specific applications examples will include integrated circuits, MEMS devices, plasmonic sensors and light emitting diodes.
Keywords :
electron beams; focused ion beam technology; light emitting diodes; micromechanical devices; plasmonics; MEMS devices; cross sectional imaging; electron beams; focused ion beams; high resolution sputtering; integrated circuits; ion beam induced deposition; light emitting diodes; plasmonic device fabrication; plasmonic sensors; semiconductor device fabrication;
Conference_Titel :
Electrical Communications and Computers (CONIELECOMP), 2011 21st International Conference on
Conference_Location :
San Andres Cholula
Print_ISBN :
978-1-4244-9558-0
DOI :
10.1109/CONIELECOMP.2011.5749314
