DocumentCode :
2942628
Title :
Effect of Annealing on Extraordinary Hall Effects in Sputtered Granular Cu80Co20 Thin Films
Author :
Kim, N.H. ; Wang, J.Q.
Author_Institution :
Binghamton Univ., Binghamton
fYear :
2006
fDate :
8-12 May 2006
Firstpage :
526
Lastpage :
526
Abstract :
The work focuses on the extraordinary Hall effect (EHE) properties of annealed Cu80Co20 thin films by examining the magneto-transport in a series of thin films with vol.20% Co annealed at various temperatures. The films were sputtered on Si at base pressures below 1.5 times 10-7 Torr. Thinner films of 40 nm were made for Hall effect measurements while thicker films of 105 nm were made for magnetic measurements. These films were patterned into standard Hall bars followed by subsequent ex-situ annealing in vacuum chamber at temperatures ranging from 100 to 500degC for 60 minutes. The SQUID magnetometer was used to measure magnetic susceptibilities (chi-T) versus temperature, followed by magnetic hystereses (M-H) in a cyclic field ranging from -5.0 to +5.0 Tesla at 10 and 300 K. The magneto-transport was measured in a magneto-measurement system in a cyclic field ranging from -8.00 to +8.00 Tesla.
Keywords :
Hall effect; SQUID magnetometers; aggregation; annealing; cobalt alloys; copper alloys; discontinuous metallic thin films; granular materials; magnetic hysteresis; magnetic susceptibility; magnetic thin films; sputtered coatings; thermal diffusion; Cu80Co20; Curie-Weiss analyses; Langevin analyses; SQUID magnetometer; aggregation; extraordinary Hall effects; magnetic hystereses; magnetic susceptibilities; magnetotransport; microstructure evolution; particle size; size distribution; sputtered granular thin films; thermal diffusion; vacuum chamber annealing; Annealing; Hall effect; Magnetic field measurement; Magnetic films; Magnetic properties; Magnetic variables measurement; Semiconductor films; Sputtering; Temperature distribution; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-1479-2
Type :
conf
DOI :
10.1109/INTMAG.2006.376250
Filename :
4261959
Link To Document :
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