OPC rule management system for SoC

Author

Nakajo, Aki ; Miyazaki, Isao ; Matsuoka, Shigemitsu

Author_Institution

Renesas Technol. Corp, Itami

fYear

2007

fDate

15-17 Oct. 2007

Firstpage

1

Lastpage

3

Abstract

We have developed a new document management system that aimed at change management of mask layout correction procedure that consists of OPC (Optical Proximity Correction) processing and lithography manufacturability checks in SoC (System on Chip) high-mix and small-quantity production. By systematically managing the OPC rule and the lithography manufacturability check result, we have eliminated mask correction troubles due to OPC management misled operation and lithography manufacturability check omission, and reduce the time of trouble solution of mask data correction originating.

Keywords

integrated circuit manufacture; large scale integration; masks; photolithography; proximity effect (lithography); system-on-chip; OPC rule management system; SoC; large-scale integrated circuit manufacturing; lithography manufacturability check omission; mask data correction; mask layout correction procedure; optical proximity correction processing; system on chip; Cities and towns; Lithography; Manufacturing processes; Optical distortion; Paper technology; Pulp manufacturing; Resists; System-on-a-chip; Technology management; Virtual manufacturing;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on

Conference_Location

Santa Clara, CA

ISSN

1523-553X

Print_ISBN

978-1-4244-1142-9

Electronic_ISBN

1523-553X

Type

conf

DOI

10.1109/ISSM.2007.4446791

Filename

4446791