Title :
OPC rule management system for SoC
Author :
Nakajo, Aki ; Miyazaki, Isao ; Matsuoka, Shigemitsu
Author_Institution :
Renesas Technol. Corp, Itami
Abstract :
We have developed a new document management system that aimed at change management of mask layout correction procedure that consists of OPC (Optical Proximity Correction) processing and lithography manufacturability checks in SoC (System on Chip) high-mix and small-quantity production. By systematically managing the OPC rule and the lithography manufacturability check result, we have eliminated mask correction troubles due to OPC management misled operation and lithography manufacturability check omission, and reduce the time of trouble solution of mask data correction originating.
Keywords :
integrated circuit manufacture; large scale integration; masks; photolithography; proximity effect (lithography); system-on-chip; OPC rule management system; SoC; large-scale integrated circuit manufacturing; lithography manufacturability check omission; mask data correction; mask layout correction procedure; optical proximity correction processing; system on chip; Cities and towns; Lithography; Manufacturing processes; Optical distortion; Paper technology; Pulp manufacturing; Resists; System-on-a-chip; Technology management; Virtual manufacturing;
Conference_Titel :
Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
978-1-4244-1142-9
Electronic_ISBN :
1523-553X
DOI :
10.1109/ISSM.2007.4446791
