• DocumentCode
    2943953
  • Title

    Manufacturing constraints — reducing Volatile Organic Compound air emissions

  • Author

    Stewart, Scott

  • Author_Institution
    Intel Corp., Hillsboro
  • fYear
    2007
  • fDate
    15-17 Oct. 2007
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    This paper explores the challenge faced by semiconductor manufacturing facilities to reduce their environmental footprint and avoid regulatory constraints. Wafer fabs continue to increase in size and complexity, while regulatory emissions limits continue to shrink. Focus is on volatile organic compound emissions (VOCs), which pose the most likely constraining air permit limit. Areas covered include common air permit limits and requirements, analysis of VOC sources at a typical semiconductor facility and examples of wins from Intel´s VOC reduction toolbox including improved waste management procedures. Finally attention is given to remaining emissions problems and what must be done to ensure future manufacturing capability.
  • Keywords
    air pollution control; manufacturing processes; organic compounds; semiconductor technology; surface cleaning; Intel VOC reduction toolbox; VOC sources; air permit limit; environmental footprint; regulatory constraints; regulatory emissions; semiconductor manufacturing facilities; surface cleaning; volatile organic compound air emissions reduction; wafer fabs; Chemicals; Manufacturing; Methanol; Personnel; Preventive maintenance; Production facilities; Semiconductor device manufacture; Solvents; Surface cleaning; Volatile organic compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
  • Conference_Location
    Santa Clara, CA
  • ISSN
    1523-553X
  • Print_ISBN
    978-1-4244-1142-9
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • DOI
    10.1109/ISSM.2007.4446795
  • Filename
    4446795