DocumentCode :
2943953
Title :
Manufacturing constraints — reducing Volatile Organic Compound air emissions
Author :
Stewart, Scott
Author_Institution :
Intel Corp., Hillsboro
fYear :
2007
fDate :
15-17 Oct. 2007
Firstpage :
1
Lastpage :
5
Abstract :
This paper explores the challenge faced by semiconductor manufacturing facilities to reduce their environmental footprint and avoid regulatory constraints. Wafer fabs continue to increase in size and complexity, while regulatory emissions limits continue to shrink. Focus is on volatile organic compound emissions (VOCs), which pose the most likely constraining air permit limit. Areas covered include common air permit limits and requirements, analysis of VOC sources at a typical semiconductor facility and examples of wins from Intel´s VOC reduction toolbox including improved waste management procedures. Finally attention is given to remaining emissions problems and what must be done to ensure future manufacturing capability.
Keywords :
air pollution control; manufacturing processes; organic compounds; semiconductor technology; surface cleaning; Intel VOC reduction toolbox; VOC sources; air permit limit; environmental footprint; regulatory constraints; regulatory emissions; semiconductor manufacturing facilities; surface cleaning; volatile organic compound air emissions reduction; wafer fabs; Chemicals; Manufacturing; Methanol; Personnel; Preventive maintenance; Production facilities; Semiconductor device manufacture; Solvents; Surface cleaning; Volatile organic compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
Conference_Location :
Santa Clara, CA
ISSN :
1523-553X
Print_ISBN :
978-1-4244-1142-9
Electronic_ISBN :
1523-553X
Type :
conf
DOI :
10.1109/ISSM.2007.4446795
Filename :
4446795
Link To Document :
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