Title :
Development of a Xenon recycling and supply system for plasma process
Author :
Yamawaki, M. ; Urakami, T. ; Ishihara, Y. ; Shirai, Y. ; Teramoto, A. ; Ohmi, T.
Author_Institution :
TAIYO NIPPON SANSO Corp., Ibaraki
Abstract :
Xenon (Xe) has been used in damage-free plasma processes for realizing future semiconductor device manufacturing, even though being very rare and expensive. Therefore, we developed a system that can recycle with a high recovery ratio and supply low-cost Xe. This system can separate Xe from gas mixtures, including Nitrogen (N2), Argon (Ar), Oxygen (O2), Hydrogen (H2), and Helium (He), with a 99.999 % recovery ratio. Usage of this system lowered Xe costs to less than 1/100th the cost of a Xe cylinder.
Keywords :
recycling; semiconductor device manufacture; xenon; plasma process; semiconductor device manufacturing; supply system; xenon recycling; Argon; Costs; Helium; Manufacturing processes; Plasma devices; Plasma materials processing; Recycling; Semiconductor device manufacture; Semiconductor devices; Xenon;
Conference_Titel :
Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
978-1-4244-1142-9
Electronic_ISBN :
1523-553X
DOI :
10.1109/ISSM.2007.4446797
