• DocumentCode
    2943988
  • Title

    Development of a Xenon recycling and supply system for plasma process

  • Author

    Yamawaki, M. ; Urakami, T. ; Ishihara, Y. ; Shirai, Y. ; Teramoto, A. ; Ohmi, T.

  • Author_Institution
    TAIYO NIPPON SANSO Corp., Ibaraki
  • fYear
    2007
  • fDate
    15-17 Oct. 2007
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Xenon (Xe) has been used in damage-free plasma processes for realizing future semiconductor device manufacturing, even though being very rare and expensive. Therefore, we developed a system that can recycle with a high recovery ratio and supply low-cost Xe. This system can separate Xe from gas mixtures, including Nitrogen (N2), Argon (Ar), Oxygen (O2), Hydrogen (H2), and Helium (He), with a 99.999 % recovery ratio. Usage of this system lowered Xe costs to less than 1/100th the cost of a Xe cylinder.
  • Keywords
    recycling; semiconductor device manufacture; xenon; plasma process; semiconductor device manufacturing; supply system; xenon recycling; Argon; Costs; Helium; Manufacturing processes; Plasma devices; Plasma materials processing; Recycling; Semiconductor device manufacture; Semiconductor devices; Xenon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
  • Conference_Location
    Santa Clara, CA
  • ISSN
    1523-553X
  • Print_ISBN
    978-1-4244-1142-9
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • DOI
    10.1109/ISSM.2007.4446797
  • Filename
    4446797
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2943988