Applying the AVM system for run-to-run control: A preliminary study

Author

Chiu, Yu-Chen ; Lin, Li-Ren ; Mo, Wei-Cheng

Author_Institution

Motech Ind. Inc., Tainan, Taiwan

fYear

2012

fDate

11-14 July 2012

Firstpage

478

Lastpage

483

Abstract

In the PECVD process of solar-cell manufacturing, the sampling rate is less than 10%. However, run-to-run (R2R) control requires 100 % total inspection. To fulfill this requirement, numerous measurements are necessary, thus increasing production cycle time and cost. To resolve this problem, previous studies have proposed virtual metrology (VM). This paper describes how the R2R controller utilizes the VM value and batch information at the first run to calculate the suggestion value of the deposition time for the ensuing run to improve the process capability index (Cpk).

Keywords

inspection; plasma CVD; process capability analysis; solar cells; virtual instrumentation; AVM system; Cpk improvement; PECVD process; R2R control; VM value; automatic virtual metrology; batch information; deposition time; inspection; plasma enhanced chemical vapor deposition; process capability index improvement; production cycle cost; production cycle time; run-to-run control; sampling rate; solar-cell manufacturing; Accuracy; Boats; Electron tubes; Manufacturing processes; Metrology; Process control; Servers; Run-to-run control; virtual metrology (VM);

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Intelligent Mechatronics (AIM), 2012 IEEE/ASME International Conference on

Conference_Location

Kachsiung

ISSN

2159-6247

Print_ISBN

978-1-4673-2575-2

Type

conf

DOI

10.1109/AIM.2012.6265978

Filename

6265978