DocumentCode
2944436
Title
Energy spectrum of the quantum-dot in a Si single-electron-device
Author
Ishikuro, H. ; Hiramoto, T.
Author_Institution
Inst. of Ind. Sci., Tokyo Univ., Japan
fYear
1997
fDate
23-25 June 1997
Firstpage
84
Lastpage
85
Abstract
We have extracted the energy spectrum of the quantum dot in a Si single electron transistor from the gate voltage and drain voltage dependence of the drain current. The device used is a point contact MOSFET acting as a single quantum dot transistor fabricated on a SOI substrate using the anisotropic etching technique. The width of the most constricted part of the channel is less than 10 nm. Negative differential conductance is observed in the single electron transistor. The experimental results suggest that accurate understanding of the electronic states in the dot becomes much more important for the design of extremely small single electron devices for room temperature operation.
Keywords
MOSFET; elemental semiconductors; excited states; ground states; negative resistance; quantum interference phenomena; semiconductor quantum dots; semiconductor quantum wells; silicon; silicon-on-insulator; single electron transistors; 10 nm; Coulomb blockade oscillations; SOI substrate; Si; Si single electron transistor; anisotropic etching technique; channel width; drain current; drain voltage dependence; electronic states; excited states; extremely small single electron devices; gate voltage dependence; ground states; negative differential conductance; point contact MOSFET; quantum dot energy spectrum; room temperature operation; single quantum dot transistor; Anisotropic magnetoresistance; Electronic mail; Etching; MOSFET circuits; Quantum dots; Quantum mechanics; Single electron devices; Single electron transistors; Stationary state; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference Digest, 1997. 5th
Conference_Location
Fort Collins, CO, USA
Print_ISBN
0-7803-3911-8
Type
conf
DOI
10.1109/DRC.1997.612483
Filename
612483
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