DocumentCode :
2944525
Title :
Ru/NiFeX/Si seedlayer to attain finer grains in CoCrPt-SiO2 perpendicular magnetic recording layer
Author :
Kong, S. ; Kim, H. ; Lee, H. ; Oh, H. ; Kim, Y.
Author_Institution :
Samsung Inst.of Technol., Yongin
fYear :
2006
fDate :
8-12 May 2006
Firstpage :
627
Lastpage :
627
Abstract :
In this study, we propose thin NiFeX/Si seedlayer for getting good crystallographic structure as well as finer grains of thin Ru layer. However, relatively thick thickness in the Ru layer deposited onto bcc-like thin Ta layer is needed for attaining the required crystallographic properties. Such thick intermediate layer causes to degrade the recording performances owing to deteriorated writing field gradient.
Keywords :
interface roughness; iron alloys; nickel alloys; perpendicular magnetic recording; ruthenium; silicon; CoCrPt-SiO2; Ru-NiFe-Si; crystallographic orientation; crystallographic structure; interface roughness; perpendicular magnetic recording layer; writing field gradient; Amorphous materials; Crystallography; Degradation; Disk recording; Glass; Laboratories; Microstructure; Perpendicular magnetic recording; Writing; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-1479-2
Type :
conf
DOI :
10.1109/INTMAG.2006.376351
Filename :
4262060
Link To Document :
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