Title :
Reduction of Ru Interlayer Thickness for CoCrPt-SiO2 Perpendicular Recording Media
Author :
Shen, W. ; Das, A. ; Racine, M. ; Cheng, R. ; Judy, J.H. ; Wang, J.
Author_Institution :
Minnesota Univ., Minneapolis
Abstract :
In this paper, a CoCrPt-SiO2 based recording media with reduced Ru interlayer thickness was investigated. The Ta seedlayer, Ru interlayer and magnetic layer were deposited by DC magnetron sputtering on cover glass substrates. Magnetic properties were tested using a vibrating sample magnetometer; interface morphology was examined by X-ray reflectivity and atomic force microscopy; and film orientation and microstructure were evaluated by X-ray diffraction and transmission electron microscopy.
Keywords :
X-ray diffraction; X-ray reflection; atomic force microscopy; chromium alloys; cobalt alloys; interface structure; magnetic multilayers; perpendicular magnetic recording; platinum alloys; ruthenium; silicon compounds; sputtered coatings; tantalum; transmission electron microscopy; CoCrPt-SiO2; DC magnetron sputtering; Ru-Ta; X-ray diffraction; X-ray reflectivity; atomic force microscopy; cover glass substrates; film orientation; interface morphology; interlayer thickness; magnetic layer; magnetic properties; microstructure; perpendicular recording media; seedlayer; transmission electron microscopy; vibrating sample magnetometer; Atomic force microscopy; Glass; Magnetic force microscopy; Magnetic properties; Magnetometers; Perpendicular magnetic recording; Sputtering; Substrates; Testing; Transmission electron microscopy;
Conference_Titel :
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-1479-2
DOI :
10.1109/INTMAG.2006.376354
