Reduction of Ru Interlayer Thickness for CoCrPt-SiO2 Perpendicular Recording Media

Author

Shen, W. ; Das, A. ; Racine, M. ; Cheng, R. ; Judy, J.H. ; Wang, J.

Author_Institution

Minnesota Univ., Minneapolis

fYear

2006

fDate

8-12 May 2006

Firstpage

630

Lastpage

630

Abstract

In this paper, a CoCrPt-SiO₂ based recording media with reduced Ru interlayer thickness was investigated. The Ta seedlayer, Ru interlayer and magnetic layer were deposited by DC magnetron sputtering on cover glass substrates. Magnetic properties were tested using a vibrating sample magnetometer; interface morphology was examined by X-ray reflectivity and atomic force microscopy; and film orientation and microstructure were evaluated by X-ray diffraction and transmission electron microscopy.

Keywords

X-ray diffraction; X-ray reflection; atomic force microscopy; chromium alloys; cobalt alloys; interface structure; magnetic multilayers; perpendicular magnetic recording; platinum alloys; ruthenium; silicon compounds; sputtered coatings; tantalum; transmission electron microscopy; CoCrPt-SiO₂; DC magnetron sputtering; Ru-Ta; X-ray diffraction; X-ray reflectivity; atomic force microscopy; cover glass substrates; film orientation; interface morphology; interlayer thickness; magnetic layer; magnetic properties; microstructure; perpendicular recording media; seedlayer; transmission electron microscopy; vibrating sample magnetometer; Atomic force microscopy; Glass; Magnetic force microscopy; Magnetic properties; Magnetometers; Perpendicular magnetic recording; Sputtering; Substrates; Testing; Transmission electron microscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2006. INTERMAG 2006. IEEE International

Conference_Location

San Diego, CA

Print_ISBN

1-4244-1479-2

Type

conf

DOI

10.1109/INTMAG.2006.376354

Filename

4262063