Title :
Development of an automatic CD control system for Cu damascene etching
Author :
Nambu, Hidetaka ; Akimoto, Takeshi
Author_Institution :
NEC Electron. Corp., Sagamihara
Abstract :
A CD control technique for Cu damascene interconnection manufacturing was studied. To achieve target wire capacity and resistance, it is required that the CD of trench is always constant. In this issue, we developed newly CD control technique, and furthermore, the advanced CD control system was released for 90 nm LSI manufacturing, and it was achieved that efficient and accurate CD control on mass production of System LSI.
Keywords :
etching; integrated circuit interconnections; integrated circuit manufacture; large scale integration; mass production; process control; LSI manufacturing; automatic CD control system; damascene etching; damascene interconnection manufacturing; mass production; size 90 nm; target wire capacity; Automatic control; Control systems; Etching;
Conference_Titel :
Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
978-1-4244-1142-9
Electronic_ISBN :
1523-553X
DOI :
10.1109/ISSM.2007.4446832
