DocumentCode :
2944639
Title :
Effect of Deposition Rate on Microstructure of CoCrPt-SiO2 Granular Longitudinal Media for Tape Applications
Author :
Wang, L. ; Lee, H. ; Qin, Y. ; Bain, J.A. ; Laughlin, D.E.
Author_Institution :
Carnegie Mellon Univ., Pittsburgh
fYear :
2006
fDate :
8-12 May 2006
Firstpage :
634
Lastpage :
634
Abstract :
This work focuses on the effect of deposition rate in the longitudinal version of this materials system. Since two phase segregation must occur during the sputter deposition process, it is anticipated that deposition rate may be a crucial deposition parameter, and that high deposit rates may not allow this segregation to proceed to completion in each layer of the depositing film before being buried by subsequent layers.
Keywords :
chromium alloys; cobalt alloys; crystal microstructure; platinum alloys; segregation; silicon compounds; sputter deposition; CoCrPt-SiO2; deposition rate effect; granular longitudinal media; microstructure; phase segregation; sputter deposition; tape applications; Application software; Grain size; Magnetic films; Magnetic separation; Materials science and technology; Microstructure; Perpendicular magnetic recording; Sputtering; Substrates; Time measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-1479-2
Type :
conf
DOI :
10.1109/INTMAG.2006.376358
Filename :
4262067
Link To Document :
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