Title :
Fast characterization of electrical fails overlaying to inline defect inspection during 90 nm copper logic technology development
Author :
Weiß, Volkmar ; Fuhrmann, Erik ; Junge, Axel ; Lutz, Robert ; Rochel, Markus ; Seider-Schmidt, Martina ; Unger, Ralph-Stephan ; Wallace, Christine ; Kuei, Johnny
Author_Institution :
Infineon Technol. Dresden, Dresden
Abstract :
The killer defect re-review method enables a fast identification of front end of line (FEOL) failure modes which is one of the keys to shorten yield learning cycles. This paper describes a combination of overlay techniques of electrical and defect inspection data on one hand and semi-automated defect review of electrically failing structures on the other hand. It was used during the 90 nm copper logic technology development in a joint project of Infineon Technologies Dresden and PDF Solutions and reduced physical failure analysis needs. A comparison of the overall defect density learning rates (including FEOL and copper back end of line limited yields) during 90 nm using this method and 130 nm copper logic technology development is given.
Keywords :
failure analysis; inspection; semiconductor technology; Infineon Technologies Dresden; PDF Solutions; copper logic technology development; electrically failing structures; front end of line failure modes; inline defect inspection; killer defect re-review method; overlay techniques; size 90 nm; Contacts; Copper; Failure analysis; Inspection; Logic testing; Mass production; Paper technology; Scanning electron microscopy; Throughput; Transmission electron microscopy;
Conference_Titel :
Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
978-1-4244-1142-9
Electronic_ISBN :
1523-553X
DOI :
10.1109/ISSM.2007.4446891