Title :
Particle removal performance of 20nm rated filters for advanced wet chemical cleaning
Author :
Nose, Masashi ; Mizuno, Takehito ; Tsuzuki, Shuichi ; Numaguchi, Toru
Author_Institution :
Nihon Pall Ltd., Ibaraki
Abstract :
The newest 20 nm rated PTFE Alter revealed better performance in both theoretical simulation of particle reduction rate in the bath and actual number of particles on wafers at a fab as compared to the conventional 30 nm ratied filter. As a result, optimally designed 20 nm rated filter is strongly recommended to use as recirculation filters in wet-benches for advanced semiconductor manufacturing process.
Keywords :
cleaning; filtration; semiconductor device manufacture; PTFE alter; advanced wet chemical cleaning; particle reduction rate; particle removal performance; rated filters; recirculation filters; semiconductor manufacturing process; Bellows; Biomembranes; Chemical technology; Cleaning; Filters; Lithography; Manufacturing processes; Semiconductor device manufacture; Test equipment; Testing;
Conference_Titel :
Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
978-1-4244-1142-9
Electronic_ISBN :
1523-553X
DOI :
10.1109/ISSM.2007.4446893
