Title :
Effects of post-annealing on magnetic properties and microstructure of CoCrPt-SiO2 perpendicular magnetic recording media
Author :
Park, S. ; Kim, S. ; Oh, H. ; Kim, Y. ; Hong, D. ; Lee, T.
Author_Institution :
Korea Adv. Inst. of Sci. & Technol., Daejeon
Abstract :
In this work, the effects of post-annealing of CoCrPt-SiO2/Ru perpendicular magnetic recording media on magnetic properties and microstructure have been studied. CoCrPt-SiO2/Ru/Ta thin films were deposited on Si substrate by a dc magnetron sputtering method at room temperature and followed by post-annealing for 30 minutes in the range of 100 ~ 240degC. Magnetic properties such as magnetization, coercivity (Hc) and negative nucleation field (Hn) were measured by a vibrating sample magnetometer. Magnetic anisotropic constant (Ku) of the films was measured by a torque magnetometer. Microstructural and chemical changes were studied.
Keywords :
annealing; chromium alloys; cobalt alloys; coercive force; crystal microstructure; magnetic anisotropy; magnetic thin films; magnetisation; nucleation; perpendicular magnetic recording; platinum alloys; ruthenium; silicon alloys; sputter deposition; tantalum; thin films; CoCrPt-SiO2; Si; coercivity; magnetic anisotropic constant; magnetic properties; magnetization; magnetron sputtering; microstructure; negative nucleation field; perpendicular magnetic recording media; post-annealing; silicon substrate; temperature 100 degC to 240 degC; temperature 293 K to 298 K; thin films; time 30 min; torque magnetometer; vibrating sample magnetometer; Magnetic anisotropy; Magnetic field measurement; Magnetic properties; Magnetometers; Microstructure; Perpendicular magnetic anisotropy; Perpendicular magnetic recording; Semiconductor thin films; Sputtering; Temperature distribution;
Conference_Titel :
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-1479-2
DOI :
10.1109/INTMAG.2006.376421
