DocumentCode :
2946558
Title :
Performance of a Silicon-Based Spin Diffusion Transistor
Author :
Dennis, C. ; Hourdakis, E. ; Chen, P. ; Zimmerman, N. ; Egelhoff, W., Jr.
Author_Institution :
NIST, Gaithersburg
fYear :
2006
fDate :
8-12 May 2006
Firstpage :
738
Lastpage :
738
Abstract :
The electrical and magnetic characteristics of three-terminal, Si-based spin diffusion transistor are described, both theoretically and experimentally. The device, functions by using a ferromagnetic emitter to inject spin-polarized carriers via a tunnel barrier into a silicon base. Moreover, the current gain is magnetically sensitive, assuming that the base width is less than the silicon spin diffusion length. Theoretically, these devices can be modeled quantum mechanically as two tunnel barriers in series, with the base controlling the relative applied bias. Experimentally, this device has both a Schottky barrier and a tunnel barrier present at the ferromagnet/Si interface.
Keywords :
Schottky barriers; charge injection; elemental semiconductors; ferromagnetic materials; magnetoelectronics; silicon; spin dynamics; spin polarised transport; tunnel transistors; Schottky barrier; Si; electrical characteristics; ferromagnetic emitter; magnetic characteristics; silicon spin diffusion length; silicon-based spin diffusion transistor; spin-polarized carrier injection; tunnel barrier; Electrons; Magnetic separation; Magnetoelectronics; NIST; Polarization; Radiative recombination; Schottky barriers; Silicon; Spontaneous emission; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-1479-2
Type :
conf
DOI :
10.1109/INTMAG.2006.376462
Filename :
4262171
Link To Document :
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