Title :
Micromagnetic simulation of magnetic triangularly shaped nanoelement formed by nanosphere lithography
Author :
Zhong, Z. ; Liu, S. ; Tang, X. ; Tang, K. ; Zhang, H.
Author_Institution :
Univ. of Electron. Sci. & Technol. of China, Chengdu
Abstract :
In this paper, we adopt micromagnetic simulation based minimizing the energy to study the ground state of TSN formed by NSL, and to understand the reversal magnetization mechanism of this nanostructures.The ground state and magnetization process of the triangularly shaped nanoelements formed by monolayer nanosphere lithography were simulated by micromagnetic formalism. The simulation showed that TSN had four ground states dependent on the thickness and lateral size of the nanoelement.
Keywords :
ground states; magnetisation reversal; micromagnetics; monolayers; nanolithography; nanostructured materials; ground state; magnetic triangularly shaped nanoelement; micromagnetic simulation; monolayer nanosphere lithography; monolayers; nanostructure material; reversal magnetization mechanism; Anisotropic magnetoresistance; Educational institutions; Lithography; Magnetization processes; Micromagnetics; Nanostructures; Saturation magnetization; Self-assembly; Shape control; Stationary state;
Conference_Titel :
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-1479-2
DOI :
10.1109/INTMAG.2006.376483
