DocumentCode :
2949160
Title :
A Single-Photon Avalanche Diode in CMOS 0.5μm n-well process
Author :
Bowei Zhang ; Zhenyu Li ; Zaghloul, Mona E.
fYear :
2012
fDate :
28-31 Oct. 2012
Firstpage :
1
Lastpage :
4
Abstract :
A Single-Photon Avalanche Diode (SPAD) design solution that can be implemented in a low cost CMOS process, n-well 0.5μm process, is proposed. This SPAD design used the lateral diffusion of the n-wells to create a low n doping density area as the guard ring to prevent the premature breakdown at the edge of SPAD. Through the TCAD simulation and fabricated design characterization, we found the proper gap length between n-wells to create the guard ring that allows the SPAD to work in the Geiger Mode. The SPAD has dark count rate (DCR) of 750/Hz at 14.85V bias voltage without cooling and 60ns dead time.
Keywords :
CMOS integrated circuits; avalanche breakdown; avalanche photodiodes; diffusion; CMOS; DCR; Geiger mode; SPAD design; TCAD simulation; dark count rate; fabricated design characterization; frequency 750 Hz; guard ring; lateral diffusion; n-well process; premature breakdown; single photon avalanche diode; size 0.5 mum; voltage 14.85 V; CMOS integrated circuits; CMOS process; Electric breakdown; Junctions; Photonics; Semiconductor device modeling; Semiconductor process modeling; CMOS; Geiger Mode; SPAD; dark count rate; dead time; n-well process;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Sensors, 2012 IEEE
Conference_Location :
Taipei
ISSN :
1930-0395
Print_ISBN :
978-1-4577-1766-6
Electronic_ISBN :
1930-0395
Type :
conf
DOI :
10.1109/ICSENS.2012.6411333
Filename :
6411333
Link To Document :
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