Title :
Thermal modeling and control of rapid thermal processing systems
Author :
Ebert, J.L. ; Emami-Naeini, A. ; Aling, H. ; Kosut, R.L.
Author_Institution :
Integrated Syst. Inc., Santa Clara, CA, USA
Abstract :
Rapid thermal processing (RTP) is becoming increasingly more important in semiconductor wafer fabrication. A nonlinear physical model for a generic RTP system is described. This generic RTP system is representative of the state-of-the-art RTP systems. A low-order nonlinear model is developed. A model-based LQG controller is designed for the low-order model which successfully controls the full-order nonlinear simulation model
Keywords :
control system synthesis; linear quadratic Gaussian control; process control; rapid thermal processing; reduced order systems; full-order nonlinear simulation model; low-order nonlinear model; model-based LQG controller; nonlinear physical model; rapid thermal processing systems; semiconductor wafer fabrication; thermal modeling; Control systems; Fabrication; Fluid flow; Heat transfer; Lamps; Nonlinear control systems; Rapid thermal processing; Semiconductor device modeling; Silicon; Temperature;
Conference_Titel :
Decision and Control, 1995., Proceedings of the 34th IEEE Conference on
Conference_Location :
New Orleans, LA
Print_ISBN :
0-7803-2685-7
DOI :
10.1109/CDC.1995.480278
