Title :
Chemically assisted nitrogen ion beam etching of polymeric optical waveguide
Author :
Taguchi, Katsuhisa ; Ueguchi, T. ; Ikeda, Makoto
Author_Institution :
Dept. of Electron. & Electr. Eng., Fukuyama Univ., Japan
Abstract :
Summary form only. We fabricated PMMA optical waveguides by conventional photolithographic and dry etching processes. The influence of process parameters such as gas composition, kinetic energy of the ion and sample temperatures was investigated in detail in order to discuss the dry etching mechanism of polymer which consists of C-H-O bands.
Keywords :
optical fabrication; optical polymers; optical waveguides; photolithography; sputter etching; C-H-O; C-H-O bands; N; PMMA optical waveguide fabrication; chemically assisted nitrogen ion beam etching; dry etching mechanism; dry etching processes; gas composition; kinetic energy; photolithographic processes; polymeric optical waveguide; process parameters; sample temperatures; Chemicals; Etching; Ion beams; Nitrogen; Optical polymers; Optical waveguides; Particle beam optics; Slabs;
Conference_Titel :
Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on
Conference_Location :
Nice
Print_ISBN :
0-7803-6319-1
DOI :
10.1109/CLEOE.2000.910020
