DocumentCode
2951510
Title
Asymmetry is I-V characteristic and responsivity of GaAs/AlGaAs quantum well infrared photodetector
Author
Na Li ; Chan, Y.C. ; Lam, Y.L. ; Ning Li ; Fu, L. ; Lu, Wenchao ; Shen, S.C. ; Tan, H.H. ; Jagadish, C.
Author_Institution
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
fYear
2000
fDate
10-15 Sept. 2000
Abstract
Summary form only given. GaAs/AlGaAs quantum well infrared photodetectors (QWIPs) have attracted much interest in the past few years. Highly uniform large area pixel arrays of 256/spl times/256 and 640/spl times/480 and possessing excellent imaging performance have been achieved. The quantum well structure of the QWIP is designed in a symmetrical configuration with the infrared QW absorption layer sandwiched between 1.0 /spl mu/m of top and bottom Si-doped (5/spl times/10/sup 17/ /cm/sup 3/) GaAs contact layers. In theoretical analysis, the shape of the quantum well is normally assumed to be rectangular as well as symmetrical with atomically smooth interfaces. However, obvious asymmetry between positive and negative current is commonly observed from the measurement results of the current-voltage (I-V) characteristics of the QWIP device. We have also found that the responsivity is asymmetrical under forward and reverse bias voltages. We demonstrate that both of these factors contribute to the I-V current asymmetry of QWIPs by comparing samples grown by molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD).
Keywords
III-V semiconductors; MOCVD; aluminium compounds; gallium arsenide; infrared detectors; molecular beam epitaxial growth; optical arrays; optical fabrication; photodetectors; quantum well devices; semiconductor heterojunctions; GaAs-AlGaAs; GaAs/AlGaAs quantum well infrared photodetector; I-V characteristics; I-V current asymmetry; Si-doped GaAs contact layers; asymmetry; atomically smooth interface; current-voltage characteristics; forward bias voltages; imaging performance; infrared QW absorption layer; infrared photodetector; large area pixel arrays; measurement results; metalorganic chemical vapor deposition; molecular beam epitaxy; negative current; positive current; quantum well; quantum well infrared photodetector; quantum well structure; rectangular shaped quantum well; responsivity; reverse bias voltages; symmetrical configuration; symmetrical quantum wells; Atomic layer deposition; Atomic measurements; Electromagnetic wave absorption; Gallium arsenide; Molecular beam epitaxial growth; Optical imaging; Photodetectors; Pixel; Quantum mechanics; Shape;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on
Conference_Location
Nice
Print_ISBN
0-7803-6319-1
Type
conf
DOI
10.1109/CLEOE.2000.910048
Filename
910048
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