Sub-micron period grating structures in Ta/sub 2/O/sub 5/ and InO/sub x/ thin oxide films, fabricated using 248 nm interferometric excimer laser ablation

Summary form only given. Thin oxide films have proven to be useful materials for the realisation of versatile and functional optoelectronic devices, since they can be fabricated using well-characterised and cost-effective methods and they often offer a unique combination of good optical and electrical properties. Thin oxide films are used in optical communications, imaging and waveguide sensing. The micro-patterning of thin oxide films may play a key-role in the application of this kind of films to useful optoelectronic devices. High resolution features are required, if thin oxide films are used as waveguide overlayered Bragg gratings, or photonic band-gaps located in the 15 /spl mu/m or visible band.