DocumentCode
2951948
Title
Laser micron particle removal from silicon surfaces: a bidimensional approach
Author
Neves, P. ; Arronte, M. ; Vilar, R.
Author_Institution
Dept. de Engenharia de Mater., Inst. Superior Tecnico, Lisbon, Portugal
fYear
2000
fDate
10-15 Sept. 2000
Abstract
Summary form only given. In this work, experimental measurements of cleaning efficiency for three different metallic particulate contaminants (Au, 1.2 /spl mu/m; Cu 3 /spl mu/m and W 0.7 /spl mu/m) on silicon are reported. To study the dependence of cleaning efficiency on the type of contaminant, absorption of laser radiation by particles and substrate is considered. The shadow effect of the metallic particles on the substrate imposes a bidimensional analysis of the temperature profile in the substrate.
Keywords
laser materials processing; light absorption; silicon; substrates; surface cleaning; 0.7 mum; 1.2 mum; 3 mum; Au; Cu; Si; W; bidimensional analysis; bidimensional approach; cleaning efficiency; contaminant; laser micron particle removal; laser radiation absorption; metallic particles; metallic particulate contaminants; shadow effect; silicon surfaces; temperature profile; Argon; Cleaning; Gas lasers; Gases; Laser beams; Oxidation; Semiconductor films; Silicon; Substrates; Surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on
Conference_Location
Nice
Print_ISBN
0-7803-6319-1
Type
conf
DOI
10.1109/CLEOE.2000.910071
Filename
910071
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