DocumentCode
2952584
Title
Suppression of self-heating effect employing bulk vertical-channel bipolar junction transistor (BJT) type capacitorless 1T-DRAM cell
Author
Imamoto, Takuya ; Endoh, Tetsuo
Author_Institution
Grad. Sch. of Eng., Tohoku Univ., Sendai, Japan
fYear
2013
fDate
7-10 Oct. 2013
Firstpage
1
Lastpage
2
Abstract
Excellent thermal characteristics of the bulk vertical-channel bipor junction transistor (BJT) type 1T-DRAM compared to the SOI planar type with 20nm generation. The bulk vertical type can operate with the low increase of lattice temperature (ΔTLmax) of 26K and high enough read current margin of 1.8μA/cell, while the SOI planar type shows large ΔTLmax value of 58K.
Keywords
DRAM chips; bipolar transistors; silicon-on-insulator; SOI planar type; bipolar junction transistor; bulk vertical-channel BJT-type capacitorless 1T-DRAM cell; read current margin; self-heating effect suppression; size 20 nm; temperature 26 K; temperature 58 K; Junctions; Lattices; Logic gates; MOSFET; Random access memory; Silicon-on-insulator;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2013 IEEE
Conference_Location
Monterey, CA
Type
conf
DOI
10.1109/S3S.2013.6716574
Filename
6716574
Link To Document