Profile of second-order nonlinearity and charge distribution induced in thermally poled fused silica

Summary form only given. Thermally induced second-order susceptibility located beneath the anodic surface over a 10 /spl mu/m thick layer has been measured in thermally poled fused silica glasses. For many practical applications, one need to largely control the profile and the location of /spl chi/. We propose a non destructive method that allow us to infer the profile and location of the nonlinear area and makes it possible to deduce the charge distribution induced within the poled glass sample. The fused silica samples were poled at -350/spl deg/C and applying a DC voltage of 3.5 kV. A SHG signal was generated within the poled samples utilizing two non-collinear 120 fs pulses making a small angle /spl Theta/ between them.