Title :
AlGaAs QPM waveguides fabricated by GaAs/Ge/GaAs [100] sublattice reversal epitaxy
Author :
Koh, S. ; Kondo, T. ; Shiraki, Y. ; Ito, R.
Author_Institution :
Dept. of Appl. Phys., Tokyo Univ., Japan
Abstract :
Summary form only given. Periodically domain-inverted GaAs crystals for quasi phase matched (QPM) devices have attract much attention because the large optical nonlinearity of GaAs crystals, e.g. d/sub 35/(GaAs)=170 pm at 1.064 /spl mu/m, will offer high conversion efficiency. Periodically domain-inverted AlGaAs waveguides based on wafer bonding followed by overgrowth have been reported. We have proposed and demonstrated an alternative way, sublattice reversal epitaxy, to fabricate domain-inverted structure in the GaAs/Si/GaAs [100] system. Much higher qualities of domain-inverted GaAs epitaxial films be grown by sublattice reversal epitaxy in the lattice-matched GaAs/Ge/GeAs [100] system and GaAs overgrowth on the periodically patterned template allows us to attain periodical domain inversion in GaAs crystals.
Keywords :
III-V semiconductors; aluminium compounds; domains; gallium arsenide; molecular beam epitaxial growth; optical fabrication; optical harmonic generation; optical waveguides; ridge waveguides; wafer bonding; 1.064 mum; AlGaAs; GaAs crystals; GaAs epitaxial films; GaAs overgrowth; GaAs-Ge-GaAs; GaAs/Ge/GaAs [100] sublattice reversal epitaxy; conversion efficiency; domain-inverted; domain-inverted structure; fabrication; optical nonlinearity; overgrowth; periodical domain inversion; periodically domain-inverted AlGaAs waveguides; periodically domain-inverted GaAs crystals; periodically patterned template; quasi phase matched devices; quasi-phase matched waveguides; sublattice reversal epitaxy; wafer bonding; Epitaxial growth; Gallium arsenide; Lead compounds; MMICs; Microscopy; Reflection; Semiconductor materials; Substrates; Tensile stress;
Conference_Titel :
Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on
Conference_Location :
Nice
Print_ISBN :
0-7803-6319-1
DOI :
10.1109/CLEOE.2000.910361