DocumentCode
2957020
Title
The Future of Test -- Product Integration and its Impact on Test
Author
Campbell, Michael
fYear
2009
fDate
7-9 Oct. 2009
Firstpage
3
Lastpage
3
Abstract
Driving leading edge products with high quality while designs, flows, and processes advance with Moore´s Law will require the semiconductor industry to continue to drive for increasing innovative DFT strategies. The test industry will need to drive for new ideas in the areas of: yield analysis, modeling, test techniques, and defect / fault tolerance. To continue cost effective products while costs escalate, yield analysis will need to take far greater consideration of advanced statistical techniques including consideration of spatial randomness. As UDSM processes become more sensitive to variations in lithography, random particle defects, overlay errors, and printability, it is inevitable that new methods will need to be developed to address the economics of Moore´s Law. At the same time, this convergence will put more demand on design/ circuit techniques as well as the need for advanced yield and process control techniques. IP integration drives intersection of dissimilar IP (EG: low power, high speed, RF, etc) requirements where the need for fault tolerant design will be required to achieve HVM. The key area for new DFT development is analog like methods to accommodate defect tolerance will be required HSIO, integrated RF cores, as well as the introduction of non-conventional fabrication methods are required to meet cost, quality and reliability demands.
Keywords
design for testability; fault tolerance; semiconductor industry; DFT; HSIO; IP integration; Moore´s law; UDSM processes; advanced statistical techniques; defect tolerance; fault tolerant design; integrated RF cores; lithography; nonconventional fabrication methods; overlay errors; printability; process control techniques; product integration; random particle defects; reliability; semiconductor industry; spatial randomness; yield analysis; Costs; Design for testability; Electronics industry; Fault tolerance; Lead compounds; Lithography; Moore´s Law; Process design; Radio frequency; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Defect and Fault Tolerance in VLSI Systems, 2009. DFT '09. 24th IEEE International Symposium on
Conference_Location
Chicago, IL
ISSN
1550-5774
Print_ISBN
978-0-7695-3839-6
Type
conf
DOI
10.1109/DFT.2009.67
Filename
5372295
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