DocumentCode
295714
Title
1 kHz high repetition rate, compact ArF excimer laser and its applications
Author
Sekita, Hitoshi ; Tada, Akifumi ; Ito, Shinji
Author_Institution
Opto-Electron. Res. Labs., NEC Corp., Kawasaki, Japan
Volume
1
fYear
1995
fDate
30-31 Oct 1995
Firstpage
302
Abstract
A 1 kHz operation for an ArF excimer laser has been achieved with a compact laser system. The average output power and the electrical efficiency are 13 W and 0.83%, respectively. The clearing ratio is measured to be 3.2. A spectrally narrowed ArF excimer laser for lithography experiments has also been developed on the basis of the design for the compact ArF excimer laser. A spectral bandwidth of 0.7 pm and a pulse energy of 5 mJ/pulse is obtained
Keywords
argon compounds; excimer lasers; laser materials processing; photolithography; 0.83 percent; 1 kHz; 13 W; 5 mJ; ArF; applications; clearing ratio; compact ArF excimer laser; electrical efficiency; lithography; output power; pulse energy; repetition rate; spectral bandwidth; Chromium; Gas lasers; Laser applications; Lithography; Optical design; Optical films; Optical refraction; Power generation; Pulse measurements; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society Annual Meeting, 1995. 8th Annual Meeting Conference Proceedings, Volume 1., IEEE
Conference_Location
San Francisco, CA
Print_ISBN
0-7803-2450-1
Type
conf
DOI
10.1109/LEOS.1995.484880
Filename
484880
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