Title :
Enhancing the Scalability of Consistency-based Progressive Multiple Sequences Alignment Applications
Author :
Orobitg, M. ; Cores, F. ; Guirado, F. ; Kemena, C. ; Notredame, C. ; Ripoll, A.
Author_Institution :
Dept. of Comput. Sci., Univ. de Lleida, Lleida, Spain
Abstract :
Multiple Sequence Alignment (MSA) is an extremely powerful tool for important biological applications, such as phylogenetic analysis, identification of conserved motifs and domains and structure prediction. In this paper we propose a new approach to reduce the computational requirements of TCoffee, a memory demanding MSA tool that uses a consistency based scheme to produce more accurate alignments. Our goal is to minimize the memory constraints in order to increase the performance and scalability of the application. The experimental results show that our approach is able to reduce the memory consumption and increase both the time performance and the number and the length of sequences that the method can align. In summary, it is able to reduce the memory requirements by between 72% and 58% depending on the optimization level, improving the alignment scalability as a whole. Also, the library reduction yields a further improvement: the alignment execution time can be reduced by up to 92%. These results are obtained without a significant impact on the final alignment quality, that declines by less than 3%.
Keywords :
bioinformatics; TCoffee; alignment execution time; alignment scalability; biological applications; conserved motif identification; consistency based scheme; consistency-based progressive multiple sequences alignment applications; domain identification; library reduction; memory constraints; memory demanding MSA tool; optimization level; phylogenetic analysis; scalability enhancement; structure prediction; Complexity theory; Hidden Markov models; Libraries; Memory management; Proteins; Scalability; Multiple sequence alignment; T-Coffee; scalability;
Conference_Titel :
Parallel & Distributed Processing Symposium (IPDPS), 2012 IEEE 26th International
Conference_Location :
Shanghai
Print_ISBN :
978-1-4673-0975-2
DOI :
10.1109/IPDPS.2012.17