DocumentCode
2959094
Title
Tamper Resistivity Analysis for Nano-meter LSI with Process Variations
Author
Ikeda, Makoto ; Yamauchi, Hiroshi ; Asada, Kunihiro
Author_Institution
Univ. of Tokyo, Tokyo
fYear
2006
fDate
10-13 Dec. 2006
Firstpage
387
Lastpage
390
Abstract
We have studied tamper resistivity with process variations. We have established a simulation platform to evaluate target LSI with differential electro-magnetic analysis. We have shown that wave dynamic differential logic (WDDL) becomes weak in terms of process variation. Based on the simulation platform, we have demonstrated several design styles including short wire, wire segmentation, and 3-wire, 3-phase systems.
Keywords
cryptography; large scale integration; differential electromagnetic analysis; nanometer LSI; process variations; short wire; tamper resistivity analysis; three-phase systems; wave dynamic differential logic; wire segmentation; Analytical models; Antenna measurements; Conductivity; Cryptography; Large scale integration; Logic; Pattern analysis; Very large scale integration; Wire; Wiring;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics, Circuits and Systems, 2006. ICECS '06. 13th IEEE International Conference on
Conference_Location
Nice
Print_ISBN
1-4244-0395-2
Electronic_ISBN
1-4244-0395-2
Type
conf
DOI
10.1109/ICECS.2006.379806
Filename
4263384
Link To Document