DocumentCode :
2961832
Title :
300 mm wafer fabrication line simulation model
Author :
Shikalgar, Sameer T. ; Fronckowiak, David ; MacNair, Edward A.
Author_Institution :
Microelectron. Div., IBM, East Fishkill, NY, USA
Volume :
2
fYear :
2002
fDate :
8-11 Dec. 2002
Firstpage :
1365
Abstract :
The importance of semiconductor wafer fabrication has been increasing steadily over the past decade. Wafer fabrication is the most technologically complex and capital intensive phase in semiconductor manufacturing. It involves the processing of wafers of silicon in order to build up layers and patterns of metal and wafer material. Many operations have to be performed in a clean room environment to prevent particulate contamination of wafers. Also, since the machines on which the wafers are processed are expensive, service contention is an important concern. All these factors underline the importance of seeking policies to design and operate them efficiently. We describe a simulation model of a planned 300 mm wafer fabrication line that we are using to make strategic decisions related to the factory.
Keywords :
digital simulation; factory automation; materials handling; semiconductor device manufacture; strategic planning; 300 mm; semiconductor manufacturing; semiconductor wafer fabrication; service contention; simulation model; strategic decisions; wafer fabrication line; Atmospheric modeling; Fabrication; Inorganic materials; Materials handling; Microelectronics; Production facilities; Semiconductor device manufacture; Semiconductor device modeling; Semiconductor materials; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation Conference, 2002. Proceedings of the Winter
Print_ISBN :
0-7803-7614-5
Type :
conf
DOI :
10.1109/WSC.2002.1166403
Filename :
1166403
Link To Document :
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