• DocumentCode
    2962282
  • Title

    A New PhotoFET for Monolithic Active Pixel Sensors Using CMOS Submicronic Technology

  • Author

    Heini, Sébastien ; Hu-Guo, Christine ; Winter, Marc ; Hu, Yann

  • Author_Institution
    Inst. Pluridisciplinaire Hubert Curien, Strasbourg
  • fYear
    2006
  • fDate
    10-13 Dec. 2006
  • Firstpage
    1148
  • Lastpage
    1151
  • Abstract
    Monolithic active pixel sensors (MAPS) using standard low cost CMOS technology available from industrial manufacturers have demonstrated excellent tracking performances for minimum ionizing particles. The need for highly granular, fast, thin and radiation tolerant pixel arrays equipping vertex detectors drives an intense R&D effort, aiming to optimize the intrinsic sensor performances. Following this main issue, we present a new design of photoFET. This structure offers the advantage to integrate inside the sensing element an amplification using PMOS transistor with a high sensitivity and a large dynamic. The proposed photoFET has been implemented with an AMS 0.35 mum process. In this paper, the photoFET architectures were presented and the main measured results were shown.
  • Keywords
    CMOS image sensors; photodetectors; phototransistors; CMOS submicronic technology; PMOS transistor; PhotoFET; ionizing particles; monolithic active pixel sensors; radiation tolerant pixel arrays; size 0.35 mum; vertex detectors; CMOS image sensors; CMOS process; CMOS technology; Conductivity; Diodes; Ionizing radiation sensors; Radiation detectors; Sensor arrays; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics, Circuits and Systems, 2006. ICECS '06. 13th IEEE International Conference on
  • Conference_Location
    Nice
  • Print_ISBN
    1-4244-0395-2
  • Electronic_ISBN
    1-4244-0395-2
  • Type

    conf

  • DOI
    10.1109/ICECS.2006.379643
  • Filename
    4263575