DocumentCode
2962282
Title
A New PhotoFET for Monolithic Active Pixel Sensors Using CMOS Submicronic Technology
Author
Heini, Sébastien ; Hu-Guo, Christine ; Winter, Marc ; Hu, Yann
Author_Institution
Inst. Pluridisciplinaire Hubert Curien, Strasbourg
fYear
2006
fDate
10-13 Dec. 2006
Firstpage
1148
Lastpage
1151
Abstract
Monolithic active pixel sensors (MAPS) using standard low cost CMOS technology available from industrial manufacturers have demonstrated excellent tracking performances for minimum ionizing particles. The need for highly granular, fast, thin and radiation tolerant pixel arrays equipping vertex detectors drives an intense R&D effort, aiming to optimize the intrinsic sensor performances. Following this main issue, we present a new design of photoFET. This structure offers the advantage to integrate inside the sensing element an amplification using PMOS transistor with a high sensitivity and a large dynamic. The proposed photoFET has been implemented with an AMS 0.35 mum process. In this paper, the photoFET architectures were presented and the main measured results were shown.
Keywords
CMOS image sensors; photodetectors; phototransistors; CMOS submicronic technology; PMOS transistor; PhotoFET; ionizing particles; monolithic active pixel sensors; radiation tolerant pixel arrays; size 0.35 mum; vertex detectors; CMOS image sensors; CMOS process; CMOS technology; Conductivity; Diodes; Ionizing radiation sensors; Radiation detectors; Sensor arrays; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics, Circuits and Systems, 2006. ICECS '06. 13th IEEE International Conference on
Conference_Location
Nice
Print_ISBN
1-4244-0395-2
Electronic_ISBN
1-4244-0395-2
Type
conf
DOI
10.1109/ICECS.2006.379643
Filename
4263575
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