Title : 
MOVPE growth of high performance photodetector structures using TBA and TBP
         
        
            Author : 
Weber, J. ; Nowitzki, A. ; Gyuro, I. ; Scherb, J.
         
        
            Author_Institution : 
Alcatel Telecom Res. Div., Stuttgart, Germany
         
        
        
        
        
        
            Abstract : 
Tertiary-butyl-arsine (TEA) and tertiary-butyl-phosphine (TBP) are common alternative group V precursors for the replacement of the highly toxic arsine and phosphine. We demonstrate, that high performance devices like pin-photodetectors grown with TBA and TBP show excellent device characteristics. Extremely low dark currents of ID<100 pA at -5 V are found for 55 μm planar pin-photodiodes with an yield of 99%. Also planar 300 μm (Ø) diodes and mesa pin photodetectors (Ø=40 μm) were processed and investigated. In both cases very low dark currents of ID<0.6 nA at -5 V were measured. Beside safety aspects, the improvements in device properties together with high yields (>95%) demonstrate the suitability of TBA and TBP for the growth of high performance pin-photodetectors
         
        
            Keywords : 
III-V semiconductors; dark conductivity; gallium arsenide; indium compounds; p-i-n photodiodes; photodetectors; semiconductor epitaxial layers; semiconductor growth; vapour phase epitaxial growth; 0.6 nA; 100 pA; InP-InGaAs; MOVPE; dark currents; high performance photodetector structures; photodiodes; pin-photodetectors; tertiary-butyl-arsine; tertiary-butyl-phosphine; Absorption; Dark current; Epitaxial growth; Epitaxial layers; Indium gallium arsenide; Indium phosphide; Photodetectors; Photodiodes; Production; Temperature;
         
        
        
        
            Conference_Titel : 
Indium Phosphide and Related Materials, 1996. IPRM '96., Eighth International Conference on
         
        
            Conference_Location : 
Schwabisch-Gmund
         
        
            Print_ISBN : 
0-7803-3283-0
         
        
        
            DOI : 
10.1109/ICIPRM.1996.491970