DocumentCode :
296366
Title :
Influence of parasitic capacitances on the performance of passivated InAlAs/InGaAs HEMTs in the millimeter wave range
Author :
Schuler, O. ; Fourré, H. ; Fauquembergue, R. ; Cappy, A.
Author_Institution :
Inst. d´´Electron. et de Micro-Electron. du Nord, Villeneuve D´´Ascq, France
fYear :
1996
fDate :
21-25 Apr 1996
Firstpage :
646
Lastpage :
649
Abstract :
High performance in the millimeter wave range have been already reported for InAlAs/InGaAs High Electron Mobility Transistors (HEMTs) on InP substrates. High frequency performance is essentially limited by two elements : the feedback capacitance Cgd and the gate resistance Rg. On the first hand, many different gate geometries such as T-gate or Γ-gate have been developed to improve Rg. On the other hand, for operation stability and better reliability of MMIC´s using HEMTs, devices must be coated with a dielectric layer. However, the passivation layer increases the parasitic capacitances and then, decreases the device performance. In this paper, we present a study of the influence of parasitic capacitances such as feedback capacitance on the high-frequency characteristics of InP-based HEMTs with T-gate supported by a Si3N4 passivation layer. Extraction of S-parameters from 1 to 40 GHz, and noise measurement at 94 GHz have been performed on 0.12-0.15 μm gate length samples. First, we investigate the consequence of the cap layer underetch on the parasitic capacitances. Secondly, the effect of the dielectric coating layer under the top of the T-gate is examined
Keywords :
III-V semiconductors; S-parameters; aluminium compounds; capacitance; gallium arsenide; high electron mobility transistors; indium compounds; millimetre wave field effect transistors; passivation; semiconductor device noise; 0.12 to 0.15 micron; 1 to 94 GHz; EHF; InGaAs-InAlAs-InP; InP; InP substrates; InP-based HEMTs; MM-wave devices; S-parameters; Si3N4; Si3N4 passivation layer; T-gate; cap layer underetch; dielectric layer; feedback capacitance; gate resistance; high-frequency characteristics; millimeter wave range; noise measurement; parasitic capacitances; passivated HEMTs; Feedback; HEMTs; Indium compounds; Indium gallium arsenide; Indium phosphide; MODFETs; Millimeter wave transistors; Parasitic capacitance; Passivation; Roentgenium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1996. IPRM '96., Eighth International Conference on
Conference_Location :
Schwabisch-Gmund
Print_ISBN :
0-7803-3283-0
Type :
conf
DOI :
10.1109/ICIPRM.1996.492332
Filename :
492332
Link To Document :
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